M He, R Ishihara, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Effects of the SiO2 capping layer on the location-controlled Si grain by u-Czochralski (grain filter) process with excimer-laser, T Uchida, T Sugiura, Y Shimodaira (Eds.), In Proceedings of the 11th International Display Workshops (IDW '04) p.395-398, ITE and SID.

M He, R Ishihara, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Enlargement of location control grains grown from the grain filter with excimer laser by the capping layer, W Krautschneider, C Claeys (Eds.), In Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE) p.647-650, STW Technology Foundation.

VP Iordanov, J Bastemeijer, R Ishihara, PM Sarro, A Bossche, MJ Vellekoop (2004), Filter-protected photodiodes for high-throughput enzymatic analysis, In IEEE Sensors Journal Volume 4 p.584-588.

V Rana, R Ishihara, Y Hiroshima, D Abe, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), High performance P-channel single-crystalline Si TFTs fabricated inside a location-controlledfrain by .-Czochralski process, In IEICE Transactions on Electronics Volume 87 p.1943-1947.

FC Voogt, R Ishihara, FD Tichelaar (2004), Melting and crystallization behavior of low-pressure chemical-vapor-deposition amorphous Si films during excimer-laser annealing, In Journal of Applied Physics Volume 95 p.2873-2879.

D Danciu, R Ishihara, FD Tichelaar, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Microstructure characterisation of location-controlled Si-islands crystallised by excimer laser in the µ-Czochralski (grain filter) process, s.n. (Eds.), In AM-LCD 04; International workshop on active-matrix liquid-crystal displays - TFT technologies and related materials p.145-148, Japan Society of Applied Physics.

V Rana, R Ishihara, Y Hiroshima, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Reduction of Kink current in single grain TFT's fabricated by u-Czochralski process, T Uchida, T Sugiura, Y Shimodaira (Eds.), In Proceedings of the 11th International Display Workshops (IDW '04) p.311-314, ITE and SID.

V Rana, R Ishihara, JW Metselaar, CIM Beenakker, Y Hiroshima, D Abe, S Inoue, T Shimoda (2004), Reliability of single-crystalline Si TFTs fabricated inside a location-controlled grain, In SID'04; Society for information display 2004 international symposium p.1-4, Society for Information Display.

V Rana, R Ishihara, Y Hiroshima, D Abe, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Single grain CMOS TFT inverter inside a location-controlled grain by µ-Czochralski process, s.n. (Eds.), In AM-LCD 04; International workshop on active-matrix liquid-crystal displays - TFT technologies and related materials p.299-302, Japan Society of Applied Physics.

V Rana, R Ishihara, Y Hiroshima, D Abe, S Inoue, T Shimoda, JW Metselaar, CIM Beenakker (2004), Single-crystalline Si CMOS TFT circuit fabricated inside a location-controlled grain by m-Czochralski process, W Krautschneider, C Claeys (Eds.), In Proceedings of the 7th Annual Workshop on Semiconductor Advances for Future Electronics (SAFE) p.662-665, STW Technology Foundation.